US Patent 7858185 - High purity nanotube fabric
http://www.freepatentsonline.com/7858185.html
This latest patent from Nantero includes basic claims to purified carbon nanotube films capable of being integrated into CMOS semiconductor processes. Claim 1 reads:
1. A nanotube film comprising:
a solution-deposited network of connected and purified nanotubes on a substrate,
wherein the nanotubes form a film of substantially uniform porosity, the film is free of amorphous carbon, the film is free of polymer and surfactants, the film comprises less than about 1×1018 atoms/cm2 of metallic impurities, and the film is free of particle impurities having a diameter of greater than about 500 nm.
This latest patent from Nantero includes basic claims to purified carbon nanotube films capable of being integrated into CMOS semiconductor processes. Claim 1 reads:
1. A nanotube film comprising:
a solution-deposited network of connected and purified nanotubes on a substrate,
wherein the nanotubes form a film of substantially uniform porosity, the film is free of amorphous carbon, the film is free of polymer and surfactants, the film comprises less than about 1×1018 atoms/cm2 of metallic impurities, and the film is free of particle impurities having a diameter of greater than about 500 nm.
Labels: Nantero
posted by blaisemouttet at 1:05 PM
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