US Patent 7169989 - Etching Using Nanopipette
http://www.freepatentsonline.com/7169989.pdf
Typically etching is a batch process in which a reactive gas or liquid dissolves away material from a substrate in order to complete a microfabrication step. However, this patent proposes a more precise, albeit slower, etching method that employs a nano-sized nozzle to deliver the etching chemical.
1. A process for introducing a three-dimensional configuration of micron to sub-micron size in a polymeric substrate comprising applying an enzyme for the selective removal of sub-unit parts of the polymer to at least one predetermined area of said polymeric substrate via a pipette with a nano-sized orifice.
Typically etching is a batch process in which a reactive gas or liquid dissolves away material from a substrate in order to complete a microfabrication step. However, this patent proposes a more precise, albeit slower, etching method that employs a nano-sized nozzle to deliver the etching chemical.
1. A process for introducing a three-dimensional configuration of micron to sub-micron size in a polymeric substrate comprising applying an enzyme for the selective removal of sub-unit parts of the polymer to at least one predetermined area of said polymeric substrate via a pipette with a nano-sized orifice.
Labels: nanofluidics
posted by blaisemouttet at 6:08 PM
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